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Physical vapor deposition of thin films / John E. Mahan.
Material type:
TextPublisher: New York : John Wiley, 2000Description: xiii, 312 pages : illustrations (some color). ; 24 cmContent type: - text
- unmediated
- volume
- 0471330019
- TS695 .M33 2000
| Item type | Current library | Call number | Status | Date due | Barcode | |
|---|---|---|---|---|---|---|
| Books - Printed | PERPUSTAKAAN GUNASAMA HAB PENDIDIKAN TINGGI PAGOH Main Library General | TS695 .M33 2000 (Browse shelf(Opens below)) | Available | 1000032672 | ||
| Books - Printed | PERPUSTAKAAN GUNASAMA HAB PENDIDIKAN TINGGI PAGOH Main Library General | TS695 .M33 2000 (Browse shelf(Opens below)) | Available | 1000090837 |
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| TS695 .B37 2003 Pulsed and pulsed bias sputtering : principles and applications / | TS695 .B57 2007 Vacuum deposition onto webs, films and foils / | TS695 .G35 1991 Chemical vapor deposited materials / | TS695 .M33 2000 Physical vapor deposition of thin films / | TS695 .M33 2000 Physical vapor deposition of thin films / | TS695 .V36 2010 Vapor surface treatments / | TS695 .W36 2012 Handbook of sputter deposition technology : fundamentals and applications for functional thin films, nanomaterials and MEMS / |
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