Handbook of plasma processing technology :  fundamentals, etching, deposition and surface interactions / 
edited by Stephen M. Rossnagel, Jerome J. Cuomo, William D. Westwood. 
 - xxiii, 523 pages :  illustrations ;  25 cm. 
 - Materials science and process technology series .
<br/><br/><label>ISBN: </label>9780815512202 0815512201 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Plasma engineering.<br/>Semiconductors --Etching.<br/>Plasma etching.
<br/><br/><label>LC Class. No.: </label>TA2020   / .H36 1990