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1.
Handbook of plasma processing technology : fundamentals, etching, deposition and surface interactions / edited by Stephen M. Rossnagel, Jerome J. Cuomo, William D. Westwood. by Series:
Material type: Text Text; Format: print
Publisher: New York : Noyes Publications, 1990
Availability: Items available for loan: PERPUSTAKAAN GUNASAMA HAB PENDIDIKAN TINGGI PAGOH (1)Call number: TA2020 .H36 1990.

2.
Principles of plasma discharges and materials processing / Michael A. Lieberman, Allan J. Lichtenberg. by
Edition: 2nd ed.
Material type: Text Text; Format: print
Publisher: Hoboken, NJ : John Wiley, 2005
Availability: Items available for loan: PERPUSTAKAAN GUNASAMA HAB PENDIDIKAN TINGGI PAGOH (1)Call number: QC718.5.D9 .L53 2005.

3.
Glow discharge processes : sputtering and plasma etching / Brian Chapman. by
Material type: Text Text; Format: print
Publisher: New York : John Wiley, 1980
Availability: Items available for loan: PERPUSTAKAAN GUNASAMA HAB PENDIDIKAN TINGGI PAGOH (2)Call number: QC702.7.P6 .C42 1980, ...

4.
Handbook of advanced plasma processing techniques / R.J. Shul, S.J. Pearton (editions.). by
Material type: Text Text; Format: print ; Literary form: Not fiction
Publisher: Berlin : Springer, 2000
Availability: Items available for loan: PERPUSTAKAAN GUNASAMA HAB PENDIDIKAN TINGGI PAGOH (1)Call number: TA2020 .S58 2000.

5.
Plasma processes for semiconductor fabrication / W. N. G. Hitchon. by Series:
Material type: Text Text; Format: print
Publisher: London : Cambridge University Press, 1999
Availability: Items available for loan: PERPUSTAKAAN GUNASAMA HAB PENDIDIKAN TINGGI PAGOH (1)Call number: TK7871.85 .H57 1999.

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