| 000 | 00976cam a2200265 i 4500 | ||
|---|---|---|---|
| 001 | u98612 | ||
| 003 | SIRSI | ||
| 005 | 20240619145205.0 | ||
| 008 | 110131 eng | ||
| 020 | _a9780387367989 | ||
| 050 |
_aTK7871.99.M44 _b.E44 2009 |
||
| 100 | 1 |
_aEl-Kareh, Badih. , _eauthor _9213228 |
|
| 245 | 1 | 0 |
_aSilicon devices and process integration : _bdeep submicron and nano-scale technologies / _cBadih El-Kareh. |
| 264 | 1 |
_aNew York : _bSpringer, _c2009. |
|
| 300 |
_axxv, 597 pages : _billustrations ; _c24 cm. |
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| 336 |
_atext _btxt _2rdacontent |
||
| 337 |
_aunmediated _bn _2rdamedia |
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| 338 |
_avolume _bnc _2rdacarrier |
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| 596 | _a1 3 | ||
| 650 | 0 |
_aMetal oxide semiconductors,Complementary. _922541 |
|
| 650 | 0 |
_aLinear integrated circuits _xDesign. _917083 |
|
| 907 |
_a.b10173511 _b07-11-22 _c15-03-18 |
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| 998 |
_am _b06-11-22 _cm _da _e- _feng _g _h0 |
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| 999 |
_c10054 _d10054 |
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