| 000 | 01003cam a22002894i 4500 | ||
|---|---|---|---|
| 001 | u151586 | ||
| 003 | SIRSI | ||
| 005 | 20240619145440.0 | ||
| 008 | 030610s2003 maua b 001 0 eng | ||
| 020 | _a9781402075438 | ||
| 020 | _a140207543X | ||
| 050 | 0 | 0 |
_aTS695 _b.B37 2003 |
| 100 | 1 |
_aBarnat, Edward V. , _eauthor _977744 |
|
| 245 | 1 | 0 |
_aPulsed and pulsed bias sputtering : _bprinciples and applications / _cby Edward V. Barnat, Toh-Ming Lu. |
| 264 | 1 |
_aBoston : _bKluwer Academic, _c2003. |
|
| 300 |
_ax, 155 pages : _billustrations ; _c24 cm. |
||
| 336 |
_atext _btxt _2rdacontent |
||
| 337 |
_aunmediated _bn _2rdamedia |
||
| 338 |
_avolume _bnc _2rdacarrier |
||
| 596 | _a1 3 | ||
| 650 | 0 |
_aCathode sputtering (Plating process). _977745 |
|
| 650 | 0 |
_aThin films. _97928 |
|
| 700 | 1 |
_aLu, Toh Ming. _977746 |
|
| 907 |
_a.b10260213 _b07-11-22 _c12-09-18 |
||
| 998 |
_am _b06-11-22 _cm _da _e- _feng _gmau _h0 |
||
| 999 |
_c17399 _d17399 |
||