| 000 | 01065cam a2200301 i 4500 | ||
|---|---|---|---|
| 001 | u85505 | ||
| 003 | SIRSI | ||
| 005 | 20240619150022.0 | ||
| 008 | 110131 eng | ||
| 020 | _a047107828X | ||
| 020 | _a9780471078289 | ||
| 050 |
_aQC702.7.P6 _b.C42 1980 |
||
| 100 | 1 |
_aChapman, Brian. , _eauthor _9197378 |
|
| 245 | 1 | 0 |
_aGlow discharge processes : _bsputtering and plasma etching / _cBrian Chapman. |
| 264 | 1 |
_aNew York : _bJohn Wiley, _c1980. |
|
| 300 |
_axv, 406 pages : _billustrations ; _c24 cm. |
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| 336 |
_atext _btxt _2rdacontent |
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| 337 |
_aunmediated _bn _2rdamedia |
||
| 338 |
_avolume _bnc _2rdacarrier |
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| 596 | _a3 | ||
| 650 | 0 |
_aSputtering (Physics). _9197379 |
|
| 650 | 0 |
_aGlow discharges. _973240 |
|
| 650 | 0 |
_aPlasma etching. _919633 |
|
| 907 |
_a.b10416389 _b07-11-22 _c28-11-18 |
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| 998 |
_am _b06-11-22 _cm _da _e- _feng _g _h0 |
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| 999 |
_c32999 _d32999 |
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