Handbook of plasma processing technology : fundamentals, etching, deposition and surface interactions /
Handbook of plasma processing technology : fundamentals, etching, deposition and surface interactions /
edited by Stephen M. Rossnagel, Jerome J. Cuomo, William D. Westwood.
- xxiii, 523 pages : illustrations ; 25 cm.
- Materials science and process technology series .
9780815512202 0815512201
Plasma engineering.
Semiconductors --Etching.
Plasma etching.
TA2020 / .H36 1990
9780815512202 0815512201
Plasma engineering.
Semiconductors --Etching.
Plasma etching.
TA2020 / .H36 1990